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| LEADER |
00900cam#a2200265#a#4500 |
| 001 |
BCCAB001424 |
| 008 |
760810s1976####enka#####b####001#0#eng## |
| 005 |
20110331140905.0 |
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AR-BCCAB |
| 245 |
1 |
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|a Ion implantation, sputtering and their applications /
|c by P. D. Townsend, J. C. Kelly, N. E. W. Hartley.
|
| 260 |
# |
# |
|a London :
|b Academic Press,
|c 1976.
|
| 300 |
# |
# |
|a ix, 333 p. :
|b il. ;
|c 24 cm.
|
| 504 |
# |
# |
|a Incluye referencias bibliográficas e índices.
|
| 020 |
# |
# |
|a 0126969507
|
| 100 |
1 |
# |
|a Townsend, P. D.
|q (Peter David)
|
| 700 |
1 |
# |
|a Kelly, J. C.
|q (John Clive).
|
| 700 |
1 |
# |
|a Hartley, N. E. W.
|
| 080 |
# |
# |
|a 539.186
|
| 650 |
# |
0 |
|a Ion implantation.
|
| 650 |
# |
0 |
|a Sputtering (Physics)
|
| 650 |
# |
7 |
|a Implantacion de iones.
|2 inist
|
| 650 |
# |
7 |
|a Chisporroteo.
|2 inist
|
| 040 |
# |
# |
|a DLC
|c DLC
|d DLC
|d ICU
|b spa
|d arbccab
|
| 942 |
# |
# |
|c BK
|
| 952 |
# |
# |
|2 udc
|a ARBCCAB
|b ARBCCAB
|i 4767
|o 539.186 T665
|p 4767
|t 1
|y BK
|
