The photoelastic effect and its applications : symposium, Belgium, September 10-16, 1973 : [proceedings] /

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Detalles Bibliográficos
Autor principal: Symposium on the Photoelastic Effect and Its Applications (1973 : Ottignies, Belgium)
Autor Corporativo: Symposium on the Photoelastic Effect and Its Applications
Otros Autores: Kestens, Jean., International Union of Theoretical and Applied Mechanics., Permanent Committee for Stress Analysis., Society for Experimental Stress Analysis.
Formato: Libro
Lenguaje:
Publicado: Berlin ; New York : Springer-Verlag, 1975.
Materias:
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245 1 4 |a The photoelastic effect and its applications :  |b symposium, Belgium, September 10-16, 1973 : [proceedings] /  |c editor, Jean Kestens ; with the cooperation of the Permanent Committee for Stress Analysis and the Society for Experimental Stress Analysis (SESA). 
260 # # |a Berlin ;  |a New York :  |b Springer-Verlag,  |c 1975. 
300 # # |a xi, 638 p. :  |b il. ;  |c 24 cm. 
020 # # |a 0387072780 
111 2 # |a Symposium on the Photoelastic Effect and Its Applications  |d (1973 :  |c Ottignies, Belgium) 
700 1 # |a Kestens, Jean. 
710 2 # |a International Union of Theoretical and Applied Mechanics. 
710 2 # |a Permanent Committee for Stress Analysis. 
710 2 # |a Society for Experimental Stress Analysis. 
650 # 0 |a Photoelasticity  |v Congresses. 
010 # # |a ###75019036# 
029 # # |a NLGGC  |b 78325203X 
050 0 0 |a TA418.12  |b .S93 1973 
049 # # |a AR5A 
504 # # |a Incluye referencias bibliográficas. 
040 # # |a DLC  |c DLC  |d OCLCQ  |b spa  |d arbccab 
500 # # |a Cabecera de portada: International Union of Theoretical and Applied Mechanics. 
500 # # |a Incluye índice. 
082 0 0 |a 620.1/1295 
942 # # |c BK 
952 # # |2 udc  |a ARBCCAB  |b ARBCCAB  |i 12440  |o 539.3:061.3 S68 1973  |p 12440  |t 1  |y BK