Proceedings of the 4th International Conference on Reactive Plasmas : October 19-23, 1998, Maui, Hawaii /
Guardado en:
Autor principal: | ICRP-4 (1998 : Maui, Hawaii ) |
---|---|
Autor Corporativo: | ICRP-4 |
Otros Autores: | Kono, A., Nagoya Industrial Research Institute., International Conference on Reactive Plasmas, Symposium on Plasma Processing |
Formato: | Sin ejemplares |
Lenguaje: | |
Publicado: |
S.l. :
Organizing Committee of ICRP-3/SPP-15,
1999.
|
Colección: | Japanese Journal of Applied Physics ;
v. 38, 7B (1999) |
Materias: |
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