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|a Ion implantation in semiconductors, silicon and germanium /
|c [by] James W. Mayer, Lennart Eriksson and John A. Davies.
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| 260 |
# |
# |
|a New York :
|b Academic Press,
|c 1970.
|
| 300 |
# |
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|a xiii, 280 p. :
|b il. ;
|c 24 cm.
|
| 504 |
# |
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|a Incluye referencias bibliográficas.
|
| 020 |
# |
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|a 0124808506
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| 100 |
1 |
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|a Mayer, James W.,
|d 1930-
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| 700 |
1 |
# |
|a Eriksson, Lennart,
|d 1938-
|e joint author.
|
| 700 |
1 |
# |
|a Davies, John Arthur,
|d 1927-
|e joint author.
|
| 650 |
# |
0 |
|a Ion implantation.
|
| 650 |
# |
0 |
|a Semiconductors.
|
| 010 |
# |
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|a ###75107563#
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| 050 |
0 |
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|a TK7871.85
|b .M38
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| 040 |
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|a DLC
|c DLC
|d DLC
|b spa
|d arbccab
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| 082 |
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|a 621.381/52
|
| 942 |
# |
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|c BK
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| 952 |
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|2 udc
|a ARBCCAB
|b ARBCCAB
|i 7122
|o 621.382 M452
|p 7122
|t 1
|y BK
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