Dielectric thin films for future ULSI devices : science and technology, Tokyo, November 5-7, 2008.

Dielectric thin films for future ULSI devices : science and technology, Tokyo, November 5-7, 2008.

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Detalles Bibliográficos
Autor principal:	International Workshop on Dielectric Thin Films for Future ULSI Devices (2008 : Tokyo)
Autor Corporativo:	International Workshop on Dielectric Thin Films for Future ULSI Devices
Formato:	Sin ejemplares
Lenguaje:
Publicado:	Tokyo : The Japan Society of Applied Physics, 2009.
Materias:	Thin films > Congresses.

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