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800514s1980####nyua##########001#0#eng## |
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|a Glow discharge processes :
|b sputtering and plasma etching /
|c Brian Chapman.
|
| 260 |
# |
# |
|a New York :
|b Wiley,
|c 1980.
|
| 300 |
# |
# |
|a xv, 406 p. :
|b il. ;
|c 24 cm.
|
| 504 |
# |
# |
|a Bibliografía: p. 397-400.
|
| 020 |
# |
# |
|a 047107828X
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| 100 |
1 |
# |
|a Chapman, Brian N.
|
| 080 |
# |
# |
|a 539.231
|
| 650 |
# |
0 |
|a Sputtering (Physics)
|
| 650 |
# |
0 |
|a Glow discharges.
|
| 650 |
# |
0 |
|a Plasma etching.
|
| 040 |
# |
# |
|a DLC
|c DLC
|d DLC
|b spa
|d arbccab
|
| 500 |
# |
# |
|a "A Wiley-Interscience publication."
|
| 500 |
# |
# |
|a Incluye índice.
|
| 856 |
4 |
2 |
|3 Reseña
|u http://www.loc.gov/catdir/description/wiley034/80017047.html4#
|3 Indice
|u http://www.loc.gov/catdir/tocs/onix05/80017047.html
|
| 942 |
# |
# |
|c BK
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| 952 |
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|2 udc
|a ARBCCAB
|b ARBCCAB
|i 8255
|o 539.231 Ch366
|p 8255
|t 1
|y BK
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