Dry process /
"... papers presented at the 18th Dry Process Symposium (DPS´96) which was held in the Waseda Univerity International Conference Center Tokyo, November 5th to 6th, 1996 ...". -- foreword
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| Formato: | Sin ejemplares |
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| Publicado: |
Tokyo, Japan :
JJAP,
1997.
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| Colección: | Japanese Journal of Applied Physics. Part 1 : Regular papers, short notes & review papers,
v. 36, no. 4B |
| Materias: |
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| 245 | 1 | 0 | |a Dry process / |c edited by Yasuhiro Horiike ... [et al.]. |
| 260 | # | # | |a Tokyo, Japan : |b JJAP, |c 1997. |
| 300 | # | # | |a 2435-2567 p. |
| 520 | # | # | |a "... papers presented at the 18th Dry Process Symposium (DPS´96) which was held in the Waseda Univerity International Conference Center Tokyo, November 5th to 6th, 1996 ...". -- foreword |
| 111 | 2 | # | |a Dry Process Symposium |n (18th : |d 1996 : |c Waseda Univerity International Conference Center Tokyo) |
| 080 | # | # | |a 533.924:061.3 |
| 650 | # | 7 | |a Plasma |2 inist |
| 650 | # | 7 | |a Etching |2 inist |
| 650 | # | 7 | |a Congresses. |2 inist |
| 650 | # | 7 | |a Congresos. |2 inist |
| 700 | 1 | # | |a Horiike, Yasuhiro, |e ed. |4 edt |
| 490 | 1 | # | |a Japanese Journal of Applied Physics. Part 1 : Regular papers, short notes & review papers, |v v. 36, no. 4B |x 0021-4922 ; |
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