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| LEADER |
00812nam#a22002295a#4500 |
| 008 |
100205s2009####ja#a##########100#0#eng#d |
| 005 |
20100205164939.0 |
| 001 |
BCCAB015949 |
| 003 |
AR-BCCAB |
| 245 |
1 |
0 |
|a Recent advances in the dry process and related technologies.
|
| 260 |
# |
# |
|a Tokyo, Japan :
|b The Japan Society of Applied Physics,
|c 2009.
|
| 300 |
# |
# |
|a p. :
|b il. ;
|c 30 cm.
|
| 490 |
1 |
# |
|a Japanese Journal of Applied Physics. ;
|v v. 48 no. 8,
|x 0021-4922
|
| 111 |
2 |
# |
|a International Symposium on Dry Process (DPS
|d (2008)
|
| 080 |
# |
# |
|a 533.924:061.3
|
| 650 |
# |
7 |
|a Plasma
|2 inist
|
| 650 |
# |
7 |
|a Etching
|2 inist
|
| 650 |
# |
7 |
|a Congresses.
|2 inist
|
| 650 |
# |
7 |
|a Congresos.
|2 inist
|
| 040 |
# |
# |
|a arbccab
|b spa
|
| 942 |
# |
# |
|c BK
|
| 952 |
# |
# |
|2 udc
|7 NOT_LOAN
|a ARBCCAB
|b ARBCCAB
|i 015949_nuevo-0
|o JPN. J. APPL. PHYS. 2009
|p 015949_nuevo-0
|t 1
|y BK
|
