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03107cas#a2200589#a#4500 |
001 |
RCBCCAB019714 |
005 |
20101201112039.0 |
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t| |
008 |
820818d19831990nyubr#p#######0###a0eng#c |
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AR-BCCAB |
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# |
# |
|a ###83642371#
|z sn#82003446#
|
016 |
7 |
# |
|a 9890567
|2 DNLM
|
016 |
7 |
# |
|a SR0088360
|2 DNLM
|
022 |
0 |
# |
|a 0734-211X
|l 0734-211X
|2 1
|
030 |
# |
# |
|a JVTBD9
|
032 |
# |
# |
|a 718090
|b USPS
|
037 |
# |
# |
|b AIP Subscription Fulfillment Division, 500 Sunnyside Blvd., Woodbury, NY 11797
|
040 |
# |
# |
|a NSDP
|c NSDP
|d MH
|d DLC
|d NST
|d DLC
|d OCoLC
|d NST
|d AIP
|d NST
|d AIP
|d NSDP
|d AIP
|d NSDP
|d NST
|d NSDP
|d NST
|d NSDP
|d AIP
|d NST
|d DLC
|d NST
|d DLC
|d NST
|d MiU
|d DLC
|d NSDP
|d DLC
|d NSDP
|d InU
|d DLC
|d MH
|d DNLM
|d OCoLC
|d CaQMU
|d NLGGC
|d TxCM
|d CU-S
|d OCoLC
|
050 |
0 |
0 |
|a TJ940
|b .J669
|
210 |
0 |
# |
|a J. vac. sci. technol., B Microelectron. process. phenom.
|
222 |
# |
0 |
|a Journal of vacuum science & technology. B, Microelectronics processing and phenomena
|
245 |
0 |
0 |
|a Journal of vacuum science & technology.
|n B,
|p Microelectronics processing and phenomena :
|b an official journal of the American Vacuum Society.
|
246 |
3 |
0 |
|a Journal of vacuum science and technology.
|n B,
|p Microelectronics processing and phenomena
|
246 |
3 |
0 |
|a Microelectronics processing and phenomena
|
260 |
# |
# |
|a New York, N.Y. :
|b Published for the Society by the American Institute of Physics,
|c 1983-c1990.
|
300 |
# |
# |
|a 8 v. :
|b il. ;
|c 29 cm.
|
310 |
# |
# |
|a Bimonthly,
|b <Jan./Feb. 1985- >
|
321 |
# |
# |
|a Quarterly,
|b Jan.-Mar. 1983-
|
362 |
0 |
# |
|a 2nd ser., v. 1, no. 1 (Jan.-Mar. 1983)-2nd ser., v. 8, no. 6 (Nov./Dec. 1990).
|
500 |
# |
# |
|a Title from cover.
|
510 |
2 |
# |
|a Chemical abstracts
|x 0009-2258
|
530 |
# |
# |
|a Also issued on microfilm.
|
580 |
# |
# |
|a Includes: International Symposium on Electron, Ion, and Photon Beams. Proceedings of the ... International Symposium on Electron, Ion, and Photon Beams; and: Molecular Beam Epitaxy Workshop. Proceedings of the ... Molecular Beam Epitaxy Workshop, also issued separately.
|
650 |
# |
0 |
|a Vacuum technology
|v Periodicals.
|
650 |
# |
6 |
|a Vide (Technologie)
|v Périodiques.
|
650 |
# |
6 |
|a Microélectronique
|v Périodiques.
|
650 |
# |
6 |
|a Matériaux nanocristallins
|v Périodiques.
|
650 |
1 |
7 |
|a Vacuümtechniek.
|2 gtt
|
650 |
1 |
7 |
|a Micro-elektronica.
|2 gtt
|
710 |
2 |
# |
|a American Vacuum Society.
|
710 |
2 |
# |
|a American Institute of Physics.
|
776 |
0 |
8 |
|i Online version:
|t Journal of vacuum science & technology. B, Microelectronics processing and phenomena (Online)
|w (DLC) 2006263268
|w (OCoLC)71441616
|
780 |
0 |
1 |
|t Journal of vacuum science and technology
|x 0022-5355
|w (DLC) 68053979
|w (OCoLC)1754855
|w (arbccab)016871
|
785 |
0 |
0 |
|t Journal of vacuum science & technology. B, Microelectronics and nanometer structures
|x 1071-1023
|w (DLC) 94657460
|w (OCoLC)23276603
|
852 |
# |
# |
|x universal pattern
|
853 |
# |
# |
|8 1
|a v.
|b no.
|u 4
|v r
|i (year)
|j (month/month)
|w q
|x 01
|
853 |
# |
# |
|8 2
|a v.
|b no.
|u 6
|v r
|i (year)
|j (month/month)
|w b
|x 01
|
863 |
# |
# |
|8 1
|a <1>-
|i <1983>-
|x provisional
|
863 |
# |
# |
|8 2
|a <3>-
|i <1985>-
|x provisional
|
866 |
# |
0 |
|a 1983-1986, 1-4; 1987, 5 (1).
|
082 |
0 |
4 |
|a 621.5/5/05
|2 19
|
942 |
# |
# |
|c CR
|